| Vacuum System: |
molecular pump or diffusion pump, roughing pump, holding pump; |
| Control system: |
automatic or manual; |
| Parameter Storage: |
real time reading and storing the process parameters during production, based on the searchable and readable historical information, such as target power, target current, gas flow, working pressure and temperature, data analysis and process improvement are feasible. |
| Other Functions: |
functions such as anomaly alarm, failure alarm, failure detection maximal ensure the operational and personnel safety; Beijing Quality/MKS flow controller optional; |
| Driver and Rotation System: |
variable frequency inverter for rotation speed, foot pedal optional; Mitsubishi frequency converter E700, three-phase asynchronous motor, gear motor, roller side guide, etc. |
| Sputtering Target System: |
cathode arc, inverter arc power supply; sputtering target (dual round targets / flat target), mid-frequency power supply, grid bias power supply, etc.; |
| Intercept Valve System: |
electric intercept baffles up to 90°rotary angle adjustable. |
